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HfO2-assisted SiO2 reduction in HfO2/SiO2/Si stacks

✍ Scribed by Li, Xiuyan; Yajima, Takeaki; Nishimura, Tomonori; Nagashio, Kosuke; Toriumi, Akira

Book ID: 122249074
Publisher: Elsevier Science
Year: 2014
Tongue: English
Weight: 925 KB
Volume: 557
Category: Article
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2013.10.142

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