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Charge trapping in SiO2/HfO2/TiN gate stack

✍ Scribed by F Lime; G Ghibaudo; B. Guillaumot

Book ID: 108361998
Publisher: Elsevier Science
Year: 2003
Tongue: English
Weight: 496 KB
Volume: 43
Category: Article
ISSN: 0026-2714
DOI: 10.1016/s0026-2714(03)00256-7

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