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Heavy-ion-induced soft breakdown of thin gate oxides

✍ Scribed by Conley, J.F.; Suehle, J.S.; Johnston, A.H.; Wang, B.; Miyahara, T.; Vogel, E.M.; Bernstein, J.B.

Book ID: 118253175
Publisher: IEEE
Year: 2001
Tongue: English
Weight: 108 KB
Volume: 48
Category: Article
ISSN: 0018-9499
DOI: 10.1109/23.983150

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