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He-induced cavity formation in silicon upon high-temperature implantation

✍ Scribed by P.F.P Fichtner; A Peeva; M Behar; G.de M. Azevedo; R.L Maltez; R Koegler; W Skorupa


Book ID
114171915
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
244 KB
Volume
161-163
Category
Article
ISSN
0168-583X

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