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The effects of implantation temperature on He bubble formation in silicon

✍ Scribed by D.L da Silva; P.F.P Fichtner; A Peeva; M Behar; R Koegler; W Skorupa


Book ID
114164498
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
153 KB
Volume
175-177
Category
Article
ISSN
0168-583X

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