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$hbox{Al}_{2}hbox{O}_{3}$ Gate Insulator Grown by ALD]]>

✍ Scribed by Zhi Hong Liu, ; Geok Ing Ng, ; Arulkumaran, S.; Ye Maung, ; Khoon Leng Teo, ; Siew Chuen Foo, ; Sahmuganathan, V.; Tao Xu, ; Chee How Lee,

Book ID: 121479008
Publisher: IEEE
Year: 2010
Tongue: English
Weight: 435 KB
Volume: 31
Category: Article
ISSN: 0741-3106
DOI: 10.1109/LED.2009.2036135

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