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Dielectric Stacking Effect of $\hbox{Al}_{2} \hbox{O}_{3}$ and $\hbox{HfO}_{2}$ in Metal–Insulator–Metal Capacitor

✍ Scribed by Park, In-Sung; Ryu, Kyoung-min; Jeong, Jaehack; Ahn, Jinho

No coin nor oath required. For personal study only.

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