๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Hard-hydrogenated tetrahedral amorphous carbon films by distributed electron cyclotron resonance plasma

โœ Scribed by F. Piazza


Book ID
113656261
Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
314 KB
Volume
24
Category
Article
ISSN
0263-4368

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Effects of process parameters on the str
โœ Dong Xie; Hengjun Liu; Xingrui Deng; Y.X. Leng; Nan Huang ๐Ÿ“‚ Article ๐Ÿ“… 2010 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 450 KB

The paper presents the investigation of the effect of the process parameters on the structure of hydrogenated amorphous carbon (a-C:H) films deposited on Si(100) substrate by electron cyclotron resonance microwave plasma chemical vapor deposition method (ECR-PCVD). The investigation is based on an o