The deposition of hydrogenated amorphous carbon (a-C:H) films from a mixture of hydrogen and methane using the electron cyclotron resonance chemical vapour deposition (ECR-CVD) method is reported. A screen grid positioned above the substrate was used to provide an electric field to accelerate the io
โฆ LIBER โฆ
The subimplantation model for hydrogenated amorphous carbon films deposited in electron cyclotron resonance plasma
โ Scribed by O. Durand-Drouhin; M. Lejeune; R. Bouzerar; M. Benlahsen
- Publisher
- Elsevier Science
- Year
- 2001
- Tongue
- English
- Weight
- 87 KB
- Volume
- 4
- Category
- Article
- ISSN
- 1369-8001
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