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Growth and bonding structure of hard hydrogenated amorphous carbon thin films deposited from an electron cyclotron resonance plasma

✍ Scribed by Durand-Drouhin, O.; Lejeune, M.; Benlahsen, M.


Book ID
118261017
Publisher
American Institute of Physics
Year
2002
Tongue
English
Weight
348 KB
Volume
91
Category
Article
ISSN
0021-8979

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The paper presents the investigation of the effect of the process parameters on the structure of hydrogenated amorphous carbon (a-C:H) films deposited on Si(100) substrate by electron cyclotron resonance microwave plasma chemical vapor deposition method (ECR-PCVD). The investigation is based on an o