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Growth of single crystalline GaN film on Si substrate using 3C-SiC as an intermediate layer

โœ Scribed by Tetsuya Takeuchi; Hiroshi Amano; Kazumasa Hiramatsu; Nobuhiko Sawaki; Isamu Akasaki


Book ID
107790830
Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
307 KB
Volume
115
Category
Article
ISSN
0022-0248

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๐Ÿ“œ SIMILAR VOLUMES


Epitaxial growth of 3C-SiC films on Si s
โœ Kanji Yasui; Kunio Asada; Tadashi Akahane ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 231 KB

The epitaxial growth of cubic-silicon carbide SiC on Si substrates was carried out by triode plasma CVD using ลฝ . dimethylsilane DMS as source gas. The lowering of electron temperature and the reduction of the rf fluctuation of plasma space potential in the afterglow plasma region were realized by a