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Growth and Characterization of GaN Epilayers on Chemically Etched Surface of 3C-SiC Intermediate Layer Grown on Si(111) Substrate

✍ Scribed by Kang, J.H. ;Kwon, M.K. ;Rho, J.I. ;Yang, J.W. ;Lim, K.Y. ;Nahm, K.S.


Publisher
John Wiley and Sons
Year
2001
Tongue
English
Weight
116 KB
Volume
188
Category
Article
ISSN
0031-8965

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MOCVD Growth and Characterization of GaN
✍ Zhang, X. ;Chua, S. J. ;Feng, Z. C. ;Chen, J. ;Lin, J. πŸ“‚ Article πŸ“… 1999 πŸ› John Wiley and Sons 🌐 English βš– 169 KB πŸ‘ 2 views

GaN thin films have been grown on Si(001) substrate with specially designed composite intermediate layers (CIL) consisting of an ultrathin amorphous silicon layer and a GaN/Al x Ga 1Β± Β±x N multilayered buffer by low pressure metal-organic chemical vapor deposition (MOCVD). The improved film quality