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The growth of single crystalline GaN on a Si substrate using AIN as an intermediate layer

✍ Scribed by Watanabe, A.; Takeuchi, T.; Hirosawa, K.; Amano, H.; Hiramatsu, K.; Akasaki, I.


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
297 KB
Volume
128
Category
Article
ISSN
0022-0248

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The growth process of ZnO films on Si(100) by single-sour~e chemical vapour deposition (CVD) was investigated. During the initial stages of growth (film thickness <30A), oxidation of the Si substrate was observed ihich resulted in an interfacial region consisting of ZnO and Si oxides. For film thick