Growth and characterization of AlGaN/GaN HEMT on SiCOI substrates
β Scribed by M. Fieger; Y. Dikme; F. Jessen; H. Kalisch; A. Noculak; A. Szymakowski; P. v. Gemmern; B. Faure; C. Richtarch; F. Letertre; M. Heuken; R. H. Jansen
- Publisher
- John Wiley and Sons
- Year
- 2005
- Tongue
- English
- Weight
- 282 KB
- Volume
- 2
- Category
- Article
- ISSN
- 1862-6351
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Subject classification: 73.30.+y; 73.40.Kp; S7.14 Undoped AlGaN/GaN HEMTs grown on SiC substrates have recently demonstrated record output power density of 10.7 W/mm (cw) and total output power of 10 W at 10 GHz (L. F. Eastman, Joint ONR/MURI Review (5/15-16, 2001), CA (USA) [1]). In this paper, we
AlGaN/GaN high electron mobility transistor (HEMT) hetero-structures were grown on the 2-in Si (1 1 1) substrate using metalorganic chemical vapor deposition (MOCVD). Low-temperature (LT) AlN layers were inserted to relieve the tension stress during the growth of GaN epilayers. The grown AlGaN/GaN H