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Gate-Bias Stress Stability of P-Type SnO Thin-Film Transistors Fabricated by RF-Sputtering

✍ Scribed by I-Chung Chiu, ; I-Chun Cheng,

Book ID: 121701097
Publisher: IEEE
Year: 2014
Tongue: English
Weight: 803 KB
Volume: 35
Category: Article
ISSN: 0741-3106
DOI: 10.1109/led.2013.2291896

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