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Gas cluster ion beams for wafer processing

โœ Scribed by M.E. Mack


Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
282 KB
Volume
237
Category
Article
ISSN
0168-583X

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๐Ÿ“œ SIMILAR VOLUMES


Gas cluster ion beam infusion processing
โœ R. MacCrimmon; J. Hautala; M. Gwinn; S. Sherman ๐Ÿ“‚ Article ๐Ÿ“… 2006 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 309 KB

The application of gas cluster ion beam (GCIB) infusion in advanced IC fabrication is described. GCIB processes for surface modifications, additive (junction formation, deposition) and subtractive (etch) processing are discussed.