✦ LIBER ✦

Gas cluster ion beam infusion processing of semiconductors

✍ Scribed by R. MacCrimmon; J. Hautala; M. Gwinn; S. Sherman

Publisher: Elsevier Science
Year: 2006
Tongue: English
Weight: 309 KB
Volume: 242
Category: Article
ISSN: 0168-583X
DOI: 10.1016/j.nimb.2005.08.074

No coin nor oath required. For personal study only.

✦ Synopsis

The application of gas cluster ion beam (GCIB) infusion in advanced IC fabrication is described. GCIB processes for surface modifications, additive (junction formation, deposition) and subtractive (etch) processing are discussed.

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