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Summary of recent research on gas cluster ion beam process technology

โœ Scribed by Isao Yamada; Noriaki Toyoda


Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
244 KB
Volume
232
Category
Article
ISSN
0168-583X

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๐Ÿ“œ SIMILAR VOLUMES


Gas cluster ion beam infusion processing
โœ R. MacCrimmon; J. Hautala; M. Gwinn; S. Sherman ๐Ÿ“‚ Article ๐Ÿ“… 2006 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 309 KB

The application of gas cluster ion beam (GCIB) infusion in advanced IC fabrication is described. GCIB processes for surface modifications, additive (junction formation, deposition) and subtractive (etch) processing are discussed.