Freestanding GaN wafers were produced by a newly developed self-separation method. Thick GaN layers were grown using hydride vapor phase epitaxy on a sapphire substrate with GaN seeds. The separation of the thick GaN layers took place during the growth sequence at the interface of GaN/sapphire, beca
Freestanding high quality GaN substrate by associated GaN nanorods self-separated hydride vapor-phase epitaxy
β Scribed by Chao, C. L.; Chiu, C. H.; Lee, Y. J.; Kuo, H. C.; Liu, Po-Chun; Tsay, Jeng Dar; Cheng, S. J.
- Book ID
- 121480139
- Publisher
- American Institute of Physics
- Year
- 2009
- Tongue
- English
- Weight
- 587 KB
- Volume
- 95
- Category
- Article
- ISSN
- 0003-6951
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