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Formation of relaxed Si1−xGex layers on SIMOX by high-dose 74Ge ion implantation

✍ Scribed by B. Holländer; S. Mantl; W. Michelsen; S. Mesters

Book ID: 113283490
Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 206 KB
Volume: 80-81
Category: Article
ISSN: 0168-583X
DOI: 10.1016/0168-583x(93)90680-5

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