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Formation of heavily P-doped Si epitaxial film on Si(1 0 0) by multiple atomic-layer doping technique

✍ Scribed by Yosuke Shimamune; Masao Sakuraba; Junichi Murota; Bernd Tillack

Publisher: Elsevier Science
Year: 2004
Tongue: English
Weight: 114 KB
Volume: 224
Category: Article
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2003.08.033

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