𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Formation of germanium shallow junction by flash annealing

✍ Scribed by A. Satta; A. D’Amore; E. Simoen; W. Anwand; W. Skorupa; T. Clarysse; B. Van Daele; T. Janssens


Book ID
103861810
Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
265 KB
Volume
257
Category
Article
ISSN
0168-583X

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES


Ion-implantation issues in the formation
✍ E. Simoen; A. Satta; A. D’Amore; T. Janssens; T. Clarysse; K. Martens; B. De Jae 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 361 KB

This paper provides an overview of the current state-of-the-art in the formation of shallow junctions in germanium by ion implantation, covering the issues of dopant activation, diffusion and defect removal. As will be shown, for the case of p + implantations, the application of rapid thermal anneal