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Formation of CoSi2 on strained Si0.8Ge0.2 using a sacrificial Si layer

✍ Scribed by R.A. Donaton; S. Kolodinski; M. Caymax; P. Roussel; H. Bender; B. Brijs; K. Maex

Publisher: Elsevier Science
Year: 1995
Tongue: English
Weight: 784 KB
Volume: 91
Category: Article
ISSN: 0169-4332
DOI: 10.1016/0169-4332(95)00098-4

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