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Effect of Ni interlayer on stress level of CoSi2 films in Co/Ni/Si(1 0 0) bi-layered system

✍ Scribed by K. Ma; J.Y. Feng


Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
133 KB
Volume
252
Category
Article
ISSN
0169-4332

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Effects of stress on the formation and g
✍ L.W. Cheng; H.M. Lo; S.L. Cheng; L.J. Chen; C.J. Tsai πŸ“‚ Article πŸ“… 2005 πŸ› Elsevier Science 🌐 English βš– 602 KB

Effects of stress on the formation and growth of nickel silicides in Ni thin films on (0 0 1)Si have been investigated. Compressive stress induced by backside SiO 2 film on the silicon substrate was found to retard significantly the formation of Ni 2 Si, NiSi and NiSi 2 on (0 0 1)Si. On the other ha