Effects of stress on the formation and g
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L.W. Cheng; H.M. Lo; S.L. Cheng; L.J. Chen; C.J. Tsai
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Article
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2005
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Elsevier Science
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English
β 602 KB
Effects of stress on the formation and growth of nickel silicides in Ni thin films on (0 0 1)Si have been investigated. Compressive stress induced by backside SiO 2 film on the silicon substrate was found to retard significantly the formation of Ni 2 Si, NiSi and NiSi 2 on (0 0 1)Si. On the other ha