๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Effect of deposition rate and thickness on the structural and electrical properties of evaporated Ni/glass and Ni/Si(1 0 0) thin films

โœ Scribed by M. Hemmous; A. Layadi; A. Guittoum; A. Bourzami; A. Benabbas


Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
304 KB
Volume
39
Category
Article
ISSN
0026-2692

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Growth and morphology of ultra-thin Ni f
โœ C. Parra; P. Hรคberle; M.D. Martins; W.A.A. Macedo ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 310 KB

A series of Ni films with thickness from 0.2 monolayers (ML) to 12.5 ML were epitaxially grown on a Pd(1 0 0) substrate at room temperature. Growth and morphology were investigated by scanning tunneling microscopy (STM), reflection-high-energy-electron diffraction (RHEED) and Auger electron spectros

Effects of stress on the formation and g
โœ L.W. Cheng; H.M. Lo; S.L. Cheng; L.J. Chen; C.J. Tsai ๐Ÿ“‚ Article ๐Ÿ“… 2005 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 602 KB

Effects of stress on the formation and growth of nickel silicides in Ni thin films on (0 0 1)Si have been investigated. Compressive stress induced by backside SiO 2 film on the silicon substrate was found to retard significantly the formation of Ni 2 Si, NiSi and NiSi 2 on (0 0 1)Si. On the other ha