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Reliability assessment of SiO2/ZrO2 stack gate dielectric on strained-Si/Si0.8Ge0.2 heterolayers under dynamic and AC stress

✍ Scribed by M.K. Bera; C. Mahata; C.K. Maiti


Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
733 KB
Volume
11
Category
Article
ISSN
1369-8001

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