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Flow Modulation Growth of Thick GaN by Hydride Vapor Phase Epitaxy

✍ Scribed by Zhang, W. ;Riemann, T. ;Alves, H.R. ;Heuken, M. ;Veit, P. ;Pfisterer, D. ;Hofmann, D.M. ;Blaesing, J. ;Krost, A. ;Christen, J. ;Meyer, B.K.


Publisher
John Wiley and Sons
Year
2001
Tongue
English
Weight
99 KB
Volume
188
Category
Article
ISSN
0031-8965

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✦ Synopsis


We demonstrate in this work the effects of flow modulation on the crystalline quality and morphology of GaN epilayers grown by hydride vapor phase epitaxy. The improvement in the structural qualtiy is attributed to the strain relaxation, dislocations suppression and enhanced Ga diffusion.


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Subject classification: 73.61.Ey; 81.15.Kk; S7.14 One-, two-and three-flow metalorganic vapor phase epitaxy (MOVPE) methods have been compared in GaN growth, and each growth is analyzed by computational fluid dynamics (CFD). It is found that two-flow method shows better growth condition for achievin