Flow Modulation Growth of Thick GaN by Hydride Vapor Phase Epitaxy
β Scribed by Zhang, W. ;Riemann, T. ;Alves, H.R. ;Heuken, M. ;Veit, P. ;Pfisterer, D. ;Hofmann, D.M. ;Blaesing, J. ;Krost, A. ;Christen, J. ;Meyer, B.K.
- Publisher
- John Wiley and Sons
- Year
- 2001
- Tongue
- English
- Weight
- 99 KB
- Volume
- 188
- Category
- Article
- ISSN
- 0031-8965
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β¦ Synopsis
We demonstrate in this work the effects of flow modulation on the crystalline quality and morphology of GaN epilayers grown by hydride vapor phase epitaxy. The improvement in the structural qualtiy is attributed to the strain relaxation, dislocations suppression and enhanced Ga diffusion.
π SIMILAR VOLUMES
Subject classification: 73.61.Ey; 81.15.Kk; S7.14 One-, two-and three-flow metalorganic vapor phase epitaxy (MOVPE) methods have been compared in GaN growth, and each growth is analyzed by computational fluid dynamics (CFD). It is found that two-flow method shows better growth condition for achievin