Plasma-polymerized films of vinyltriethoxysilane were prepared by plasma-enhanced chemical vapor deposition using an RF (13.56 MHz) helical coupling plasma system operated in a pulsed regime. Thin films deposited under the same deposition conditions but with different thicknesses (9.5 nm-10.5 ยตm) we
โฆ LIBER โฆ
Film growth and relationship between microstructure and mechanical properties of a-C:H:F films deposited by PECVD
โ Scribed by Freire, F.L; Maia da Costa, M.E.H; Jacobsohn, L.G; Franceschini, D.F
- Book ID
- 120176543
- Publisher
- Elsevier Science
- Year
- 2001
- Tongue
- English
- Weight
- 133 KB
- Volume
- 10
- Category
- Article
- ISSN
- 0925-9635
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