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Structural and mechanical properties of a-C:H thin films grown by RF-PECVD

✍ Scribed by Tomasella, E; Thomas, L; Dubois, M; Meunier, C


Book ID
121897727
Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
171 KB
Volume
13
Category
Article
ISSN
0925-9635

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Amorphous hydrogenated carbon (a-C:H), Si-containing a-C:H and a-C:H/Si-containing a-C:H multilayered films have been deposited by low frequency plasma enhanced chemical vapour deposition (LF-PECVD) from cyclohexane and/or tetramethylsilane gas mixtures. Structural and mechanical properties of singl