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Optical and structural properties of RF sputtered a-C:H films

✍ Scribed by E. Ech-chamikh; E.L. Ameziane; A. Bennouna; M. Azizan; Y. Bounouh; M.L. Thèye; J. Cernogora; J.L. Faye

Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
349 KB
Volume
33
Category
Article
ISSN
0927-0248

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✍ S. V. Jagadeesh Chandra; G. Mohan Rao; S. Uthanna 📂 Article 📅 2007 🏛 John Wiley and Sons 🌐 English ⚖ 142 KB 👁 1 views

## Abstract Rf magnetron sputtering technique was employed for preparation of tantalum oxide films on quartz and crystalline silicon (111) substrates held at room temperature by sputtering of tantalum in an oxygen partial pressure of 1x10^‐4^ mbar. The films were annealed in air for an hour in the