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Fast-diffusing defects induced by copper in silicon

✍ Scribed by Th. Prescha; T. Zundel; J. Weber; H. Prigge; P. Gerlach

Publisher: Elsevier Science
Year: 1989
Tongue: English
Weight: 276 KB
Volume: 4
Category: Article
ISSN: 0921-5107
DOI: 10.1016/0921-5107(89)90220-1

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