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Point defects in silicon studied by nickel diffusion

✍ Scribed by H. Kitagawa; K. Hashimoto; M. Yoshida

Publisher: Elsevier Science
Year: 1983
Weight: 318 KB
Volume: 116
Category: Article
ISSN: 0378-4363
DOI: 10.1016/0378-4363(83)90268-1

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