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Fabrication of low-cost mold and nanoimprint lithography using polystyrene nanosphere

โœ Scribed by G.H. Jeong; J.K. Park; K.K. Lee; J.H. Jang; C.H. Lee; H.B. Kang; C.W. Yang; S.J. Suh


Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
754 KB
Volume
87
Category
Article
ISSN
0167-9317

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Nanosphere lithography (NSL) masks were created by spin-coating of polystyrene particles onto silicon surfaces. Fluorinated hydrocarbon films were coated on the nanosphere lithography masks using plasma-enhanced chemical vapor deposition (PECVD) to obtain ordered arrays of fluorinated hydrocarbon. A