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Improved mold fabrication for the definition of high quality nanopatterns by Soft UV-Nanoimprint lithography using diluted PDMS material

✍ Scribed by Namil Koo; Markus Bender; Ulrich Plachetka; Andreas Fuchs; Thorsten Wahlbrink; Jens Bolten; Heinrich Kurz


Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
830 KB
Volume
84
Category
Article
ISSN
0167-9317

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