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Fabrication of Freestanding Nanoporous Polyethersulfone Membranes Using Organometallic Polymer Resists Patterned by Nanosphere Lithography

✍ Scribed by Canet Acikgoz; Xing Yi Ling; In Yee Phang; Mark A. Hempenius; David N. Reinhoudt; Jurriaan Huskens; G. Julius Vancso


Publisher
John Wiley and Sons
Year
2009
Tongue
English
Weight
359 KB
Volume
21
Category
Article
ISSN
0935-9648

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