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Exploring Ni–Si thin-film reactions by means of simultaneous synchrotron X-Ray diffraction and substrate curvature measurements

✍ Scribed by Patrice Gergaud; Christian Rivero; Marc Gailhanou; Olivier Thomas; Benoit Froment; Hervé Jaouen

Book ID: 108215095
Publisher: Elsevier Science
Year: 2004
Tongue: English
Weight: 126 KB
Volume: 114-115
Category: Article
ISSN: 0921-5107
DOI: 10.1016/j.mseb.2004.07.037

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