Combined synchrotron x-ray diffraction and wafer curvature measurements during Ni–Si reactive film formation

✍ Scribed by Rivero, C.; Gergaud, P.; Gailhanou, M.; Thomas, O.; Froment, B.; Jaouen, H.; Carron, V.

• Book ID: 118185565
• Publisher: American Institute of Physics
• Year: 2005
• Tongue: English
• Weight: 508 KB
• Volume: 87
• Category: Article
• ISSN: 0003-6951
• DOI: 10.1063/1.1999021