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Experimental measurement of in-depth secondary defects distribution produced by helium implantation in silicon

โœ Scribed by S. Daliento; L. Mele; P. Spirito; L. Gialanella; B.N. Limata; M. Romano


Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
207 KB
Volume
253
Category
Article
ISSN
0168-583X

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