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Thermal evolution of defects produced by implantation of H, D and He in Silicon

โœ Scribed by P.J. Simpson; A.P. Knights; M. Chicoine; K. Dudeck; O. Moutanabbir; S. Ruffell; F. Schiettekatte; B. Terreault

Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
860 KB
Volume
255
Category
Article
ISSN
0169-4332

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