Full wafer size investigation of N+and P
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Blanqué, S. ;Lyonnet, J. ;Pérez, R. ;Terziyska, P. ;Contreras, S. ;Godignon, P.
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Article
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2005
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John Wiley and Sons
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English
⚖ 371 KB
## Abstract We report a full wafer size investigation of the homogeneity of electrical properties in the case of co‐implanted nitrogen and phosphorus ions in 4H–SiC semi‐insulating wafers. To match standard industrial requirements, implantation was done at room temperature. To achieve a detailed el