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Etch characteristics of CoZrNb and CoTb magnetic thin films in a high density plasma

✍ Scribed by Shin, Byul ;Song, Young Soo ;Park, Sang Jin ;Kim, Tae Wan ;Chung, Chee Won

Publisher
John Wiley and Sons
Year
2004
Tongue
English
Weight
121 KB
Volume
201
Category
Article
ISSN
0031-8965

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## Gallium indium zinc oxide High density plasma etching HBr/Ar Oxide thin film transistor Gallium indium zinc oxide (GIZO) thin films patterned with a photoresist (PR) were dry etched using inductively coupled plasma (ICP) of HBr/Ar gas. The etch rate of the GIZO films and the etch selectivity of