EPR and electrical studies of native point defects in ZnSiP2 semiconductors
โ Scribed by W Gehlhoff; D Azamat; A Krtschil; A Hoffmann; A Krost
- Publisher
- Elsevier Science
- Year
- 2003
- Tongue
- English
- Weight
- 385 KB
- Volume
- 340-342
- Category
- Article
- ISSN
- 0921-4526
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โฆ Synopsis
We present the first detection of native defects in ZnSiP 2 . Similar to p-type ZnGeP 2 , the EPR spectra of the zinc vacancy V ร Zn ; the phosphorus vacancy V 0 P ; as well as of group IV anti-site Si รพ Zn รฐGe รพ Zn ร could be proved. The influence of the group IV-ions on the bonding behavior for the different lattice sites is reflected in the differences of the EPR parameters in both lattices. In both materials, V 0 P could be observed only by photo-excitation, whereas the silicon antisite Si รพ
Zn was detectable also in the dark contrary to Ge รพ Zn : This is connected with the shift of the Fermi level in the n-type ZnSiP 2 samples. In disagreement with the recharching model developed for the dominant native defects in ZnGeP 2 we could detect both Si รพ Zn and V ร Zn in the dark. This contradiction could be resolved by scanning surface potential microscopy measurements, which have shown that the Fermi level position laterally varies in these samples, realizing the paramagnetic states of both defects in different regions of the sample.
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We demonstrate that strained GeSi/Si heterostructures act as a model system for the study of the interaction of propagating dislocations with point, line and planar defects. In such heterostructures, the effective stress acting on a propagating dislocation may be varied from tens of MPa to of order