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Enhancement of reactive sputtering rate of TiO2 using a planar and dual rotatable cylindrical magnetrons

✍ Scribed by A. Belkind; J. Wolfe

Publisher: Elsevier Science
Year: 1994
Tongue: English
Weight: 314 KB
Volume: 248
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(94)90006-x

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