✦ LIBER ✦
7179. A comparison of SiO2 planarization layers by hallow cathode enhanced direct current reactive magnetron sputtering and radio frequency magnetron sputtering: DF Dawson-Elli et al, J Vac Sci Technol, A8, 1990, 1294–1298
- Publisher
- Elsevier Science
- Year
- 1991
- Tongue
- English
- Weight
- 151 KB
- Volume
- 42
- Category
- Article
- ISSN
- 0042-207X
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