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Electroplating of Cu(Ag) thin films for interconnect applications

โœ Scribed by S. Strehle; S. Menzel; J.W. Bartha; K. Wetzig


Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
525 KB
Volume
87
Category
Article
ISSN
0167-9317

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AbstractรFree standing polycrystalline thin ยฎlms with a strong h111i texture were tested in uniaxial tension. Studied were electron-beam deposited Ag, Cu and Al ยฎlms, and Ag/Cu multilayers consisting of alternating Ag and Cu layers of equal thickness, between 1.5 nm and 1.5 mm (bilayer repeat length