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Electronic properties of Cr1−xAlxN thin films deposited by reactive magnetron sputtering

✍ Scribed by R Sanjinés; O Banakh; C Rojas; P.E Schmid; F Lévy

Book ID
114085499
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
393 KB
Volume
420-421
Category
Article
ISSN
0040-6090

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Aluminium nitride thin films deposited by DC reactive magnetron sputtering
✍ V. Dimitrova; D. Manova; T. Paskova; Tz. Uzunov; N. Ivanov; D. Dechev 📂 Article 📅 1998 🏛 Elsevier Science 🌐 English ⚖ 375 KB

AlN-films prepared by dc reactive magnetron sputtering. AlN in an Ar+N 2 gas mixture have been prepared and their microstructure, hardness, refractive index and IR transmittance examined. At l = 640 nm the refractive index was 1.93 and k = 3×10 -3 ; high transmission occurred between [??] structure