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Electron distributions for thin Ni film-MgF2 interfaces by electron induced X-ray emission

โœ Scribed by B. Iraqi; F. Vergand; D. Fargues; C. Bonnelle

Book ID
118986633
Publisher
Elsevier Science
Year
1985
Tongue
English
Weight
172 KB
Volume
162
Category
Article
ISSN
0039-6028

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โœ Jonnard, P.; Bonnelle, C.; Bosseboeuf, A.; Danaie, K.; Beauprez, E. ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 89 KB ๐Ÿ‘ 1 views

We have studied the solid/solid interface between Mo and SiO 2 films deposited, respectively, by magnetron d.c. sputtering and plasma-enhanced chemical vapour deposition (PECVD). The sample depth profile was characterized by SIMS. We used electron-induced x-ray emission spectroscopy to characterize