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Electron distributions for thin Ni Film−MgF2 interfaces by electron induced X-ray emission

✍ Scribed by B. Iraqi; F. Vergand; D. Fargues; C. Bonnelle


Publisher
Elsevier Science
Year
1985
Weight
50 KB
Volume
162
Category
Article
ISSN
0167-2584

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📜 SIMILAR VOLUMES


Investigation of an Mo/SiO2 interface by
✍ Jonnard, P.; Bonnelle, C.; Bosseboeuf, A.; Danaie, K.; Beauprez, E. 📂 Article 📅 2000 🏛 John Wiley and Sons 🌐 English ⚖ 89 KB 👁 1 views

We have studied the solid/solid interface between Mo and SiO 2 films deposited, respectively, by magnetron d.c. sputtering and plasma-enhanced chemical vapour deposition (PECVD). The sample depth profile was characterized by SIMS. We used electron-induced x-ray emission spectroscopy to characterize