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Electron-beam-resist materials with enhanced dry etch resistance

✍ Scribed by Stanley Affrossman; Hassan Angadji; Masood Bakhshaee; Kathleen Coffey; Fong Lung Chow; David Hayward; Gordon G. McLeod; Richard A. Pethrick; Paul Whittaker

Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
529 KB
Volume
30
Category
Article
ISSN
0032-3861

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