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A dry-etch resistant positive-working electron resist

โœ Scribed by E. D. Roberts

Publisher
Society for Plastic Engineers
Year
1983
Tongue
English
Weight
783 KB
Volume
23
Category
Article
ISSN
0032-3888

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โœฆ Synopsis

Abstract

This paper describes two types of crossโ€linked positiveโ€working electron resists. The first is based upon phenolโ€formaldehyde resins crosslinked to polyโ€(methyl methacrylate) by phenolic ester groups. The second type is based upon polystyrene, crosslinked by carboxylic acid anhydride groups. The resist properties can be varied by changing the proportion of crosslinks. A version of the second type which contains about 95 percent styrene units is described. This material shows very good resistance to degradation in a plasmaโ€etching process for preparing chromium on glass masks, even when it is used as a very thin film.

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